LRD 濕式機台

Dryer（200mm FRD / 300RD）

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Dryer（200mm FRD / 300RD）

Dryer blue printing
  • The method of drying by utilizing the existing Marangoni principle and Spray method
  • Effective & Stable IPA Vapor Supply
  • Equipment for cleaning using DIW
  • Minimization of W/F C/T Point
  • Hight Temp. IPA Process Possible
  • Wide Process Application（AR>10, DR<20mm）
Cassette-less／ Cassette

Good Drying Performance
－One substrate contact point (Knife type)
－Constant evaporation amount (Reliable vapor supply)
－Short vapor transfer distance (Effective vapor supply)
－No delay in supplying vapor right after N₂ supply

Simple Layout
－All in one type (No sub-module)
－Easy Maintenace
－Simple Operation

ESH Friendly
－Less IPA consumption due to short path
－No delay helps more TAT
－Fire protection; IPA heating via Hot DIW

LRD 濕式機台

Single Wet Scrubber

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Single Wet Scrubber
Single wet scrubber C

Single wet scrubber B

Single wet scrubber A

  • This equipment is a device that uses DI water for cleaning.
  • 2 ~ 8 Chambers
  • 6″, 8″, 12″ Wafer
  • Cleaning By Brushing
Single wet scrubber list
LRD 濕式機台

CDS（Chemical Delivery System）

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CDS（Chemical Delivery System）

System Concept

  1. System Flexibility
  2. Multi Chemistry
  3. Warm IPA Dryer
  4. Backside Process
  5. Mechanical Advantage
  • This equipment is a device that mixes and supplies chemicals.
  • Chemical：BOE、DHF、IPA、SC-1、SPM、etc.
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LRD 濕式機台

Single Wafer Cleaner

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Single Wafer Cleaner

Single Wafer Cleaner

Single Wafer Cleaner
Single wafter cleaner C

Single wafter cleaner B

Single wafter cleaner A

System Concept

  1. System Flexibility
  2. Multi Chemistry
  3. Warm IPA Dryer
  4. Backside Process
  5. Mechanical Advantage
  • This equipment performs a process of removing impurities and metals on the surface of the wafer using chemicals.
  • Chemical：BOE、DHF、IPA、SC-1、SPM、ETC